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eBook High Dielectric Constant Materials: VLSI MOSFET Applications (Springer Series in Advanced Microelectronics) ePub

eBook High Dielectric Constant Materials: VLSI MOSFET Applications (Springer Series in Advanced Microelectronics) ePub

by Howard Huff,David Gilmer

  • ISBN: 3540210814
  • Category: Engineering
  • Subcategory: Engineering
  • Author: Howard Huff,David Gilmer
  • Language: English
  • Publisher: Springer; 2005 edition (December 3, 2004)
  • Pages: 710
  • ePub book: 1364 kb
  • Fb2 book: 1388 kb
  • Other: doc lit lrf mbr
  • Rating: 4.6
  • Votes: 387

Description

VLSI MOSFET Applications. High-k Gate Dielectric Materials Integrated Circuit Device Design Issues. Bibliographic Information. High Dielectric Constant Materials. VLSI MOSFET Applications.

VLSI MOSFET Applications. Springer Series in Advanced Microelectronics.

High Dielectric Constant Materials: VLSI MOSFET Applications (Springer Series in Advanced Microelectronics). Howard Huff, David Gilmer. Download (pdf, . 0 Mb) Donate Read.

Ed. High Dielectric Constant Materials VLSI MOSFET Applications. International SEMATECH 2706 Montopolis Drive Austin, TX 78741 USA E-mail: howard. With 363 Figures and 31 Tables. Motorola 3501 Ed Bluestein Boulevard, MD-K10 Austin, TX 78721 USA E-mail: David.

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.

Issues relating to the high-K gate dielectric are among the greatest challenges for the . Издание: иллюстрированное.

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High Dielectric Constant Materials book.

Items related to High Dielectric Constant Materials: VLSI MOSFET Applications. High Dielectric Constant Materials: VLSI MOSFET Applications (Springer Series in Advanced Microelectronics). ISBN 13: 9783540210818.

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.